Imec, a world-leading research and innovation hub in advanced semiconductor technologies, has launched a first of its kind consortium with 26 European university groups that will jointly work on the technology roadmap beyond CMOS scaling (CMOS 2.0). This initiative will focus on design automation and chip architecture research for the next generation of chips. The consortium will benefit from the NanoIC pilot line, turning academic insights into industry-focused innovations. In the future, similar consortia will be set up around advanced materials and alternative compute systems.

CMOS 2.0 refers to a new paradigm, introduced by imec, that expands the chip making toolbox beyond traditional transistor scaling and its associated scaling challenges. CMOS 2.0 allows for more design flexibility by exploiting fine-grain wafer stacking technology to improve on-chip connectivity and offer higher technology heterogeneity to the system. It will result in tailored chips comprising multiple 3D-stacked layers that fulfil smartly partitioned functions. In that way, CMOS 2.0 will provide advanced, versatile 3D stacked platforms that push the boundaries of compute performance.