ASML Holding N.V. (ASML) today reported that Intel Foundry is using ASML's High NA EUV technology on the Intel 18A process node to produce a subset of its Intel Core Ultra Series 3 processors. This milestone marks an important step in demonstrating High NA EUV readiness in a production environment. ASML and Intel have worked closely for decades to advance lithography technology and support the continued scaling of semiconductors. The high numerical aperture extreme ultraviolet (High NA EUV) lithography process is an important next step in EUV lithography, developed by ASML to enable more precise patterning for advanced chip manufacturing.

The Intel Core Ultra Series 3 processors, code-named Panther Lake, are built on Intel 18A. The use of High NA EUV to pattern specific layers of these products provides ASML and Intel Foundry with helpful data to further refine system setup, up time and manufacturing implementation. This paves the way towards broader adoption, utilizing the full capabilities of the technology.