Today, ASML Holding and Intel Corporation announced the latest phase of their longstanding collaboration to advance the cutting edge of semiconductor lithography technology. Intel has issued its first purchase order to ASML for the delivery of the industry's first TWINSCAN EXE:5200 system - an extreme ultraviolet (EUV) high-volume production system with a high numerical aperture and more than 200 wafers per hour productivity - as part of the two companies' long-term High-NA collaboration framework.

"Intel's vision and early commitment to ASML's High-NA EUV technology is proof of its relentless pursuit of Moore's Law. Compared to the current EUV systems, our innovative extended EUV roadmap delivers continued lithographic improvements at reduced complexity, cost, cycle time and energy that the chip industry needs to drive affordable scaling well into the next decade," said ASML President and CTO Martin van den Brink.