SK hynix Inc. and Gauss Labs announced today that they participated in the SPIE AL 2024, an international conference held in San Jose, California, and presented two papers based on the latest technology for AI-based metrology. SK hynix has been collaborating closely with Gauss Labs in various areas to increase semiconductor yield and productivity, and the results of this collaboration are published in these two papers.

In the paper "Model Aggregation for Virtual Metrology for High-Volume Manufacturing," Gauss Labs introduces "aggregated AOM", an algorithm that increases the prediction accuracy of its AI-based virtual metrology solution, Panoptes VM (Virtual Metrology). Since its adoption in December 2022, SK hynix used Panoptes VM to conduct virtual measurements on more than 50 million wafers so far, which translates to more than one wafer per second. The company was able to improve process variability by 29% thanks to this technology.