Chinese company SMIC has officially achieved volume production of its newest 5 nm-class node called SMIC N+3. This is officially China's most advanced semiconductor node produced without any extreme ultraviolet (EUV) lithography tools, relying on the deep ultraviolet (DUV) to manufacture its silicon. In the latest analysis of the Huawei Kirin 9030 SoC, the TechInsights has confirmed that the chip has officially been manufactured using the new advanced node, bringing Chinese semiconductor independence one step closer to reality. This node is a full generation ahead of the older SMIC N+2, which is 7 nm-class node Huawei has been using to manufacture its Ascend series of AI accelerators and other infrastructure parts.

However, this is not without drawbacks. Since SMIC uses DUV to print silicon designs, the company faces significant challenges in realizing its silicon ambitions. For printing smaller nodes, EUV scanners offer more possibilities due to their much smaller wavelength of 13.5 nm, compared to the smallest DUV immersion scanner wavelength of 193 nm. TechInsights has confirmed that SMIC's N+3 node, despite achieving impressive DUV multi-patterning implementation, encounters significant yield challenges, particularly due to the aggressively scaled metal pitch. As a result, the Huawei Kirin 9030 SoC is likely produced at an operating loss, with a significant portion of dies being discarded or used for downgraded chips.