Applied Materials, Inc., the leader in materials engineering for the semiconductor industry, today introduced new deposition, etch and materials modification systems that boost the performance of leading-edge logic chips at 2 nm and beyond. The technologies supercharge AI compute through atomic-scale improvements to the most fundamental electronic building block - the transistor.

The transition to Gate-All-Around (GAA) transistors is a major industry inflection and a critical enabler of the energy-efficient computing needed to deliver more powerful AI chips. As 2 nm-class GAA chips ramp to volume production this year, Applied is introducing new material innovations to enhance next-generation GAA transistors for angstrom nodes. The combined impact of the new chipmaking systems contributes a significant portion of the total energy-efficient performance gains of GAA process node transitions.